{"product_id":"positive-photo-resist-developer-concentrated-418-500ml","title":"\"POSITIVE PHOTO RESIST DEVELOPER, CONCENTRATED\" (418-500ML)","description":"Description:For removing exposed resist during the positive photofabrication process. Features:Disolves exposed photoresist Concentrated formulation - dilute one part developer to ten parts water For best results; use in conjunction with M.G. Foam Brush (Cat. No. 416-S) Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) . 418-500MLManufacturer:MG ChemicalsProduct Category:ChemicalsRoHS:CompliantProduct:Prototyping\/Board RepairType:DeveloperSize:17 ozContainer:BottleFactory Pack Quantity:6Unit Weight:8 lbs","brand":"MG Chemicals","offers":[{"title":"Default Title","offer_id":40101683134579,"sku":"","price":17.06,"currency_code":"USD","in_stock":true}],"thumbnail_url":"\/\/cdn.shopify.com\/s\/files\/1\/0569\/9004\/0179\/products\/mg-418-500ML-2__79266.jpg?v=1653201254","url":"https:\/\/electronicparts-d261.myshopify.com\/products\/positive-photo-resist-developer-concentrated-418-500ml","provider":"electronicparts-d261","version":"1.0","type":"link"}